Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1998-05-19
2000-07-11
Diamond, Alan
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
4273765, 4273766, 4273767, 4273768, 427533, 427535, 427539, 427551, 427552, 427553, 427555, 427556, 427559, 4273722, 427331, 427375, 4273761, 4273762, 4273763, 4273764, 2041921, 20415715, 25049221, 2504923, 2504921, 148565, 1562722, 1562726, 438485, 438535, 438557, C23C 1416, C23C 1458, C23C 1446
Patent
active
060867264
ABSTRACT:
The present invention provides a surface modification method that provides beneficial changes in surface properties, can modify a surface to a greater depth than previous methods, and that is suitable for industrial application. The present method comprises applying a thin-film coating to a surface of a substrate, then subjecting the coated surface to an ion beam. The ion beam power pulse heats the coated surface, leading to alloying between the material in the coating and the material of the substrate. Rapid cooling of the alloyed layer after an ion beam pulse can lead to formation of metastable alloys and microstructures not accessible by conventional alloying methods or intense ion beam treatment of the substrate alone.
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Buchheit, Jr. Rudolph G.
Grabowski Kenneth S.
Renk Timothy J.
Senft Donna Cowell
Sorensen Neil R.
Diamond Alan
Grafe V. Gerald
Sandia Corporation
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