Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-07-01
1992-08-04
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, 20419227, C23C 1434
Patent
active
051356309
ABSTRACT:
A solid state light modulator structure useful in a video display system includes a deformable silicon containing gel layer on an array of charge storage elements, and an adherent, highly light reflective metal (e.g., Ag) electrode layer formed directly on the surface of the gel layer by sputtering in a non-reactive atmosphere.
REFERENCES:
patent: 4299450 (1981-11-01), Funada et al.
patent: 4626920 (1986-12-01), Glenn
Bronnes Robert L.
Goldburt Efim S.
Hemmer Richard E.
McKinlay James K.
Fox John C.
North American Philips Corporation
Weisstuch Aaron
LandOfFree
Method of metallizing silicon-containing gel for a solid state l does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of metallizing silicon-containing gel for a solid state l, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of metallizing silicon-containing gel for a solid state l will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-776183