Method of measuring thickness of thin layer in semiconductor...

Details Method of measuring thickness of thin layer in semiconductor... Method of measuring thickness of thin layer in semiconductor...

2006-06-28

2008-12-16

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S630000

Reexamination Certificate

active

07466428

ABSTRACT:
A method of measuring the thickness of a thin layer formed on a substrate comprises generating a measured signal spectrum by reflecting a light off of the thin layer and analyzing a resulting reflected light. The method further comprises generating a theoretical signal spectrum based on a putative thickness of the thin layer, and computing a skew signal spectrum as a difference between the measured signal spectrum and the theoretical spectrum. The method still comprises computing a reliability index by dividing a reference index by an area of the skew signal spectrum and using the reliability index to update the theoretical signal spectrum in a regression fitting process.

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