Method of measuring refractive index of thin film and refractive

Details Method of measuring refractive index of thin film and refractive Method of measuring refractive index of thin film and refractive

1993-08-31

1995-05-09

Rosenberger, Richard A.

Optics: measuring and testing

Refraction testing

356382, G01N 2141

Patent

active

054145066

ABSTRACT:
A method of measuring the refractive index of a thin film is composed the steps of: (a) forming a dielectric thin film which is transparent, uniform and geometrically and optically identical, on each of a first substrate and a second substrate, with the refractive indexes of the first substrate and the second substrate being different; and (b) measuring the reflectivities of the first and second substrates, each bearing the dielectric thin film thereon, with the application of a light with an identical wavelength to the two substrates, thereby measuring the refractive index of the dielectric thin film. A refractive index measuring apparatus for conducting the above method is composed of a thickness measuring optical system for sequentially guiding a luminous flux emitted from a light source to a first monitor substrate and a second monitor substrate on both of which a dielectric thin film is to be formed, and then guiding two light rays respectively reflected by the first and second monitor substrates to a light receiving unit; and an arithmetic unit for calculating the refractive index of a dielectric thin film from two intensity signals from the light receiving unit.

REFERENCES:
patent: 3744916 (1973-07-01), Bey et al.
patent: 4531838 (1983-07-01), Sawamura
patent: 4707611 (1987-11-01), Southwall

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