Method of measuring free carrier concentration and/or thickness

Details Method of measuring free carrier concentration and/or thickness Method of measuring free carrier concentration and/or thickness

1997-09-02

2000-11-28

Whitehead, Jr., Carl

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

438 14, 438 17, 438 18, H01L 2166

Patent

active

061534447

ABSTRACT:
The invention provides a method of measuring a carrier concentration and/or thickness of a semiconductor, which includes the steps of determining the carrier concentration by optical measurement means using a light having at least a frequency band which causes light absorption by free carriers in the semiconductor. A reflection amplitude ratio and a phase of the light or the result of measurement of substitute parameters therefor are obtained by the optical measurement means, and the carrier concentration and/or thickness is determined based on the reflection amplitude ratio and the phase or said result of measurement of the substitute parameter therefor.

REFERENCES:
patent: 3645631 (1972-02-01), Gupta
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 4472633 (1984-09-01), Motooka
patent: 4953983 (1990-09-01), Bottka et al.
patent: 5232547 (1993-08-01), Drowley et al.
patent: 5270536 (1993-12-01), Malhotra
patent: 5595916 (1997-01-01), Fujimura et al.
patent: 5604581 (1997-02-01), Liu et al.
Patent Abstracts of Japan, vol. 018, No. 359, Jul. 6, 1994 & JP 06 097253 A (New Japan Radio Co Ltd; Others: 01), Apr. 8, 1994 (Abstract).

Affiliated with

Also associated with

Rating

Method of measuring free carrier concentration and/or thickness does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of measuring free carrier concentration and/or thickness , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of measuring free carrier concentration and/or thickness will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1724302