Method of measuring focal point, instrument used therefor,...

Optics: measuring and testing – Focal position of light source

Reexamination Certificate

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C356S125000, C356S399000, C356S400000, C356S401000, C356S618000, C430S005000

Reexamination Certificate

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07414713

ABSTRACT:
A shape value of a pattern having a pivotal characteristic is measured (step S1), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of the measurement of the shape value (Step S2), an exposure energy is calculated (Step S3), a shape value of an isolated pattern is measured (Step S4), a second data base is accessed using a result of the measurement (Step S5), and a focal variation is determined using the calculated proper exposure energy (Step S6).

REFERENCES:
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patent: 2004/0058256 (2004-03-01), Fujisawa et al.
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patent: 11-307431 (1999-11-01), None
patent: 2000-223413 (2000-08-01), None
patent: 2002-75815 (2002-03-01), None
Patent Abstracts of Japan, Publication No. 10154647, dated Jun. 9, 1968.
Patent Abstracts of Japan, Publication No. 2000133569, dated May 12, 2000.
Japanese Office Action dated Feb. 5, 2008, issued in corresponding Japanese Application No. 2003-338142.

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