Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-03-30
2010-02-02
Chowdhury, Tarifur R. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07656518
ABSTRACT:
In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.
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Den Boef Arie Jeffrey
Van Der Mast Karel Diederick
Van Der Schaar Maurits
Akanbi Isiaka O
ASML Netherlands B.V.
Chowdhury Tarifur R.
Sterne Kessler Goldstein & Fox P.L.L.C.
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