Method of measuring and analyzing contamination particles genera

Details Method of measuring and analyzing contamination particles genera Method of measuring and analyzing contamination particles genera

1998-01-15

1999-11-16

Brock, Michael

Measuring and testing

Gas analysis

Solid content of gas

738659, 73 2806, 7386322, G01N 1502

Patent

active

059837047

ABSTRACT:
An apparatus and a method of measuring contamination particles generated during manufacturing of semiconductor devices and an analysis method therefor are described. The apparatus for measuring contamination particles has a regulator for controlling the flow of source gas, a first junction, a first filter, a first air valve, a test component, a second junction, a flow pressure reducer, a third junction, a particle counter, a second pump, a computer system, a third air valve, a flow meter, a second filter, a second air valve, a fourth junction, a third filter, an impactor, and a first pump. It is possible to analyze structures and elements of the contamination particles generated from a gas delivery system (GDS) and from at least one utility component constituting the system. Further, it is possible to set up a reference for controlling the contamination particles generated from the GDS and from at least one of the utility components.

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