Method of measuring aberrations of lens

Details Method of measuring aberrations of lens Method of measuring aberrations of lens

1999-02-18

2000-10-10

Kim, Robert

Optics: measuring and testing

Inspection of flaws or impurities

Transparent or translucent material

3562393, G01N 2100

Patent

active

061307475

ABSTRACT:
A method of measuring the aberrations of a projection lens is disclosed. In this method, a photo-mask is irradiated with an illumination beam through an illumination optics, an inspection mark which comprises a periodic pattern on the photo-mask is imaged on a substrate through a projection optics, and a measurement mark which comprises a periodic pattern corresponding to the periodic pattern of the inspection mark is provided on the substrate. A period P of the periodic pattern of the measurement mark satisfies the following condition:

REFERENCES:
patent: 5615006 (1997-03-01), Hirukawa et al.
patent: 5733687 (1998-03-01), Tanaka et al.
Hiroshi Nomura and Takashi Sato, "Overlay Error Due To Lens Coma and Asymmetric Illumination Dependence on Pattern Feature", Feb. 23-25, 1998, Proc. SPIE, vol. 3332, pp. 199-210.

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