Method of measurement, an inspection apparatus and a...

Details Method of measurement, an inspection apparatus and a... Method of measurement, an inspection apparatus and a...

2007-01-22

2009-11-17

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S620000

Reexamination Certificate

active

07619737

ABSTRACT:
Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured can be reduced. This may result in a smaller area of the scribe lane being used by targets for each layer of the substrate.

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