Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1985-11-27
1987-04-07
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430325, 430330, 430967, G03C 500
Patent
active
046561196
ABSTRACT:
A method of producing X-ray resist with etching patterns, using known supports which are coated with a film comprised of copolymers of methacrylonitrile and methacrylic acid is disclosed. This method uses the following protocol.
REFERENCES:
patent: 4415653 (1983-11-01), Lai et al.
patent: 4430419 (1984-02-01), Harada et al.
Asmussen Frithjof
Gaenzler Wolfgang
Wunderlich Winfried
Brammer Jack P.
Max-Planck-Gesellschaft Zur Foerderund der Wissenschaften
Rohm GMBH Chemische Fabrik
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