Method of manufacturing titanium magnetic disk substrate

Details Method of manufacturing titanium magnetic disk substrate Method of manufacturing titanium magnetic disk substrate

1991-02-28

1992-07-21

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, C23C 1434

Patent

active

051319950

ABSTRACT:
After the surface roughness of a titanium substrate is set to be R.sub.max .ltoreq.0.08 .mu.m, a hardened layer having a hardness of H.sub.v .gtoreq.250 is formed thereon to have a thickness of 50 to 250 .mu.m by sputtering, thereby manufacturing a titanium magnetic disk substrate.

REFERENCES:
patent: 4552820 (1985-11-01), Lin et al.
patent: 4990362 (1991-02-01), Kibe et al.

Affiliated with

Also associated with

Rating

Method of manufacturing titanium magnetic disk substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing titanium magnetic disk substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing titanium magnetic disk substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-841292