Method of manufacturing thin film transistor panel

Details Method of manufacturing thin film transistor panel Method of manufacturing thin film transistor panel

2005-05-10

2008-09-09

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S142000, C438S149000, C257SE21001, C257SE21703, C257SE21372

Reexamination Certificate

active

07422916

ABSTRACT:
A method of manufacturing a thin film transistor panel is provided, which includes forming a first signal line on a substrate. The method also includes forming in sequence a first insulating layer and a semiconductor layer on the first signal line. The method further includes patterning the semiconductor layer and the first insulating layer through one photolithography process to form a patterned semiconductor layer and a patterned first insulating layer. The method also includes forming a second signal line on the patterned semiconductor layer and the patterned first insulating layer.

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