Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2005-05-02
2008-11-18
Norton, Nadinr (Department: 1792)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S087000, C347S062000, C347S063000, C347S064000, C347S065000, C430S320000
Reexamination Certificate
active
07452474
ABSTRACT:
In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
REFERENCES:
patent: 4720716 (1988-01-01), Ikeda et al.
patent: 5491505 (1996-02-01), Suzuki et al.
patent: 5636441 (1997-06-01), Meyer et al.
patent: 5837057 (1998-11-01), Koyama et al.
patent: 6142606 (2000-11-01), Kubota et al.
patent: 6357862 (2002-03-01), Ozaki et al.
patent: 6402302 (2002-06-01), Ozaki et al.
patent: 6443563 (2002-09-01), Saito et al.
patent: 6467884 (2002-10-01), Murooka et al.
patent: 6474769 (2002-11-01), Imanaka et al.
patent: 6485132 (2002-11-01), Hiroki et al.
patent: 6513911 (2003-02-01), Ozaki et al.
patent: 6540330 (2003-04-01), Kubota et al.
patent: 6540336 (2003-04-01), Kubota et al.
patent: 6752487 (2004-06-01), Kubota et al.
patent: 6969154 (2005-11-01), Takeuchi et al.
patent: 2002/0041301 (2002-04-01), Jeon et al.
patent: 2006/0033780 (2006-02-01), Ono et al.
patent: 2006/0033782 (2006-02-01), Sakai et al.
patent: 60-159062 (1985-08-01), None
patent: 2000-177135 (2000-06-01), None
European Patent Office Communication dated Apr. 19, 2007 issued in corresponding application No. 05 009 443.2.
Communication dated May 20, 2008, from the European Patent Office in a corresponding European patent application.
Hayakawa Kazuhiro
Kanri Ryoji
Kato Masataka
Komuro Hirokazu
Koyama Shuji
Angadi Maki
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Norton Nadinr
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