Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2011-08-09
2011-08-09
Mulpuri, Savitri (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S109000, C438S618000, C257SE21585, C257SE21705
Reexamination Certificate
active
07994041
ABSTRACT:
A method of manufacturing a stacked semiconductor package using an improved technique of forming a through via in order to enable 3-dimensional vertical interconnection of stacked packages is provided. The method includes forming a seed layer required for forming a via core on a bottom surface of a wafer, forming at least one via hole vertically through the wafer, forming a via core in the via hole, insulating the via hole from the via core, and removing the seed layer from the bottom surface of the wafer. The stacked semiconductor package is suitable for high-speed signal transmission.
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Kang Hyun Seo
Lim Kwon-Seob
Blakely & Sokoloff, Taylor & Zafman
Choi Calvin
Electronics and Telecommunications Research Institute
Mulpuri Savitri
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