Method of manufacturing shadow mask and apparatus

Details Method of manufacturing shadow mask and apparatus Method of manufacturing shadow mask and apparatus

1988-05-18

1989-08-29

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156651, 156654, 1566611, 156345, 134 34, 430 23, C23F 102, B44C 122

Patent

active

048614220

ABSTRACT:
A method of manufacturing a shadow mask, comprising the steps of forming a first resist pattern having a large number of openings on one major surface of a thin metal plate and a second resist pattern on the other major surface, the second resist pattern having a large number of openings with an opening size larger than that of the first resist pattern, etching the thin metal plate surface having the first resist pattern to form first recesses, removing the first resist pattern, forming an etching-resistive layer on the thin metal plate surface having the first recesses to fill the first recesses, etching the thin metal plate surface having the second resist pattern to form second recesses which have a size larger than that of the first recesses and communicate with the first recesses, treating and swelling the etching-resistive layer with an alkali solution, spraying warm water to the etching-resistive layer to remove the etching-resistive layer, and removing the second resist pattern.

REFERENCES:
patent: 4124437 (1978-11-01), Bond et al.
patent: 4662984 (1987-05-01), Ohtake et al.
patent: 4689114 (1987-08-01), Ohtake et al.

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