Fishing – trapping – and vermin destroying
Patent
1994-08-25
1996-01-09
Fourson, George
Fishing, trapping, and vermin destroying
437201, H01L 2144
Patent
active
054828953
ABSTRACT:
A method of manufacturing a semiconductor substrate with a silicide electrode (interconnection) capable of forming a local interconnection by using a silicide formation technique. The method includes the steps of: selectively oxidizing the surface of a silicon semiconductor substrate to form a local oxide film and to define at least partially a silicon surface; depositing a cobalt film covering the silicon surface and local oxide film; depositing a silicon film on the cobalt film, and patterning the silicon film to form a silicon film pattern extending from the silicon surface to the local oxide film; forming a TiN film over the cobalt film; heating the substrate to progress a silicidation reaction between the cobalt film and silicon surface and between the cobalt film and silicon film pattern; and removing the remaining TiN film and an unreacted portion of the cobalt film.
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Fushida Atsuo
Hayashi Hiromi
Bilodeau Thomas G.
Fourson George
Fujitsu Limited
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