Method of manufacturing semiconductor devices

Details Method of manufacturing semiconductor devices Method of manufacturing semiconductor devices

1995-02-27

1998-03-24

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430394, 430396, G03F 900, G03F 720

Patent

active

057311315

ABSTRACT:
Disclosed is a method of manufacturing semiconductor devices in which a desired pattern having an area size larger than the field size that can be obtained in one exposure process step of an exposure device is formed. The manufacturing method includes the steps of dividing the desired pattern into a plurality of portions, and conducting exposure on the dividing patterns in a joined fashion.

REFERENCES:
patent: 4259724 (1981-03-01), Sugiyama
patent: 4869998 (1989-09-01), Ecctes
patent: 5132195 (1992-07-01), Pool
Rominger, "Seamless Stitching For Large Area Integrated Circuit Manufacturing", Proc. SPIE, 922, Mar. 1988, pp. 188-193.

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