Method of manufacturing semiconductor device having recess...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation

Reexamination Certificate

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C257S330000, C257SE21419, C257SE21429

Reexamination Certificate

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07413969

ABSTRACT:
A varying-width recess gate structure having a varying-width recess formed in a semiconductor device can sufficiently increase the channel length of the transistor having a gate formed in the varying-width recess, thereby effectively reducing the current leakage and improving the refresh characteristics. In the method of manufacturing the recess gate structure, etching is performed twice or more, so as to form a gate recess having varying width in the substrate, and a gate is formed in the gate recess.

REFERENCES:
patent: 5880004 (1999-03-01), Ho
patent: 2002/0064894 (2002-05-01), Lee
patent: 2005/0042833 (2005-02-01), Park et al.
patent: 2005/0212026 (2005-09-01), Chung et al.
patent: 15064950 (2004-06-01), None
patent: 11111837 (1999-04-01), None
patent: 1020000026816 (2000-05-01), None
patent: 1020000060693 (2000-10-01), None
patent: 03/103036 (2003-12-01), None
Korean Patent Gazette issued by Korean Patent Office, Aug. 8, 2006.
Text of the First Office Action issued by the Chinese Patent Office.

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