Method of manufacturing semiconductor device

Details Method of manufacturing semiconductor device Method of manufacturing semiconductor device

1980-07-07

1982-01-19

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156645, 156646, 156657, 1566591, 156662, H01L 21306

Patent

active

043115462

ABSTRACT:
A method of surface treatment of a layer grown on a semiconductor substrate by chemical vapor deposition technique for removing a projection appearing on the layer comprises the steps of forming a layer on the semiconductor substrate by chemical vapor deposition technique, forming a membrane of plastic material that resists etching on the layer, pressing a flat plate against the plastic membrane on a projection of the layer to expose the projection, and etching the projection.

REFERENCES:
patent: 3234058 (1966-02-01), Marinace
patent: 3506506 (1970-04-01), Pennebaker
patent: 3518131 (1970-06-01), Glendinning
patent: 3718514 (1973-02-01), Erdman et al.
patent: 3982976 (1976-09-01), Marciniec
patent: 3990925 (1976-11-01), Erdman et al.

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