Photocopying – Projection printing and copying cameras – Methods
Reexamination Certificate
2005-01-27
2008-03-11
Lee, Diane I. (Department: 2851)
Photocopying
Projection printing and copying cameras
Methods
Reexamination Certificate
active
07342646
ABSTRACT:
A method for modeling a photolithography process which includes the steps of generating a calibrated model of the photolithography process capable of estimating an image to be produced by the photolithography process when utilized to image a mask pattern containing a plurality features; and determining an operational window of the calibrated model, which defines whether or not the calibrated model can accurately estimate the image to be produced by a given feature in the mask pattern.
REFERENCES:
patent: 4894790 (1990-01-01), Yotsuya et al.
patent: 5097138 (1992-03-01), Wakabayashi et al.
patent: 5307296 (1994-04-01), Uchida et al.
patent: 5307421 (1994-04-01), Darboux et al.
patent: 5319564 (1994-06-01), Smayling et al.
patent: 5416729 (1995-05-01), Leon et al.
patent: 5621652 (1997-04-01), Eakin
patent: 5795688 (1998-08-01), Burdorf et al.
patent: 5825647 (1998-10-01), Tsudaka
patent: 5966312 (1999-10-01), Chen
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6081659 (2000-06-01), Garza et al.
patent: 6289499 (2001-09-01), Rieger et al.
patent: 6563566 (2003-05-01), Rosenbluth et al.
patent: 2003/0082463 (2003-05-01), Laidig et al.
patent: 2003/0082483 (2003-05-01), Laidig et al.
patent: 2003/0126581 (2003-07-01), Pang et al.
patent: 2003/0139833 (2003-07-01), Pierrat et al.
Pati Y. C, et al. “Exploiting Structure in Fast Aerial Image Computation for Integrated Circuit Patterns.” IEEE Transactions on Semiconductor Manufacturing, Feb. 1997, IEEE, USA, vol. 10, No. 1, pp. 62-74, XP002256517.
Mack C A . et al. “Metrology, Inspection, and Process Control for Microlithography XV.” Santa Clara CA, Feb. 26, 2001-Mar. 1, 2001, Vol. 4344, pp. 377-384, XP008022568.
Cobb N, et al. “Mathematical and CAD Framework for Proximity Correction. ”Optical Microlithography IX, Santa Clara, CA, Mar. 13-15, 1996, vol. 2726, pp. 208-222, XP008022569.
Crisalle et al., “A Comparison of the Optical Projection Lithography Simulators in SAMPLE and PROLITH”, IEEE Transactions on Semiconductor Manufacturing, vol. 5, No. 1, Feb. 1992, pp. 14-26.
Gopalarao, et al., “An Integrated Technology CAD System for Process and Device Designers”, IEEE Transactions on Very Large Scale Integration (VLSI) Systems, vol. 1, No. 4, Dec. 1993, pp. 482-490.
Neubauer, et al., “Imaging VLSI Cross Sections by Atomic Force Microscopy”, 1992 IEEE/IRPS, pp. 299-303.
Rodgers, “Application of the Atomic Force Microscope to Integrated Circuit Reliability and Failure Analysis”, 1991 IEEE/IRPS, pp. 250-254.
Qian et al., “A New Scaler Planewave Model for High NA Lithography Simulations”, 1994 IEEE, pp. 45-48.
Barouch, et al. “Modeling Process Latitude in UV Projection Lithography”, IEEE Electron Device Letters, vol. 12, No. 10, Oct. 1991, pp. 513-514.
Beacham, et al. “Applications of an Atomic Force Metrology System in Semiconductor Manufacturing”, SPIE, vol. 1926, pp. 311-321.
“AFMs: What Will Their Role Be?”, Semiconductor International, Aug. 1993, pp. 62-68.
Prolith/2 User's Manual, Finle Technologies, Version 3.0 for the Macintosh.
Danish Patent and Trademark Office, Danish Search Report, 2006.
Chen Jang Fung
Shi Xuelong
ASML Masktools B.V.
Lee Diane I.
Liu Chia-how Michael
LandOfFree
Method of manufacturing reliability checking and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing reliability checking and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing reliability checking and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3967923