Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1992-01-10
1993-04-06
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 427122, 427314, 427577, 427575, 423446, 428408, B05D 306, C23C 1626
Patent
active
052002314
ABSTRACT:
Method of manufacturing polycrystalline diamond layers, in which diamond crystallites are deposited by means of Chemical Vapour Deposition (CVD) on a substrate heated to a temperature ranging between 450.degree. and 1200.degree. C. from a gas phase comprising hydrogen and .ltoreq.30% of a carbon-containing gas at a pressure ranging between 10.sup.-5 and 1 bar, in which method the substrate is contacted with a gas phase having an energy content which varies in time, such that at least at the start of the deposition process the substrate is in contact with a gas phase having an energy content which is suitable for nucleating diamond crystallites in the gas phase, whereafter the substrate is contacted with a gas phase having an energy content which is increased with respect to the content at the start of the process and further diamond crystallites are formed in situ on the substrate surface nucleated with diamond crystallites formed in the gas phase.
REFERENCES:
patent: 4919974 (1990-04-01), McCune et al.
patent: 4940015 (1990-07-01), Kobashi et al.
patent: 5023109 (1991-06-01), Chin et al.
Bachmann Peter K.
Lydtin Hans
Ritz Arnd
Beck Shrive
King Roy V.
Spain Norman N.
U.S. Philips Corporation
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