Method of manufacturing photoelectric transducer with improved u

Details Method of manufacturing photoelectric transducer with improved u Method of manufacturing photoelectric transducer with improved u

1997-03-19

2000-10-17

Parker, Fred J.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427 74, 427327, 427579, B05D 310, H05H 124

Patent

active

061328170

ABSTRACT:
A method of manufacturing a photoelectric transducer forms a functional film on a conductive substrate. The method comprises applying ultrasonic cleaning with a cleaning liquid containing water to the conductive substrate, then allowing the surface of the conductive substrate to contact purified water so as to import uniform oxidation and then forming the functional film thereon. The functional film is characterized in being formed with a metal layer as light-reflecting layer, a reflection enhancing layer, and a semiconductor photovoltaic device layer, prepared by a plasma CVD method, comprising a non-monocrystalline material containing silicon atoms as the matrix.

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"Bransonic.RTM. Ultrasonic Cleaners--Operator's Manual", Bransonic Corp. 1987.
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