Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2006-06-27
2006-06-27
Deo, Duy-Vu N. (Department: 1765)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S065000, C257S048000
Reexamination Certificate
active
07067347
ABSTRACT:
In an existing optical semiconductor integrated circuit device, a silicon nitride film that is an anti-reflection film is used as an etching stopper film at the etching of an insulating film and by means of wet etching the insulating film is removed once for all. Accordingly, there is a problem in that the processing accuracy is poor. In an optical semiconductor integrated circuit device according to the present invention, after a multi-layered wiring layer is formed on a top surface of a silicon substrate, an insulating layer on a top surface of an anti-reflection film of a photodiode is removed by means of dry etching. At this time, a polycrystal silicon film is used as an etching stopper film. Thereby, in the photodiode according to the invention, although the dry etching is used, since a silicon nitride film that is an anti-reflection film is not over-etched, the dispersion of film thickness thereof can be inhibited from occurring. As a result, a photodiode according to the present invention can realize an improvement in the sensitivity of incident light and a miniaturization structure can be realized.
REFERENCES:
patent: 5917981 (1999-06-01), Kovacic et al.
patent: 6555410 (2003-04-01), Tsang
patent: 2003/0168658 (2003-09-01), Fukushima et al.
patent: 2001-320078 (2001-11-01), None
Hatsugai Akira
Okabe Katsuya
Takahashi Tsuyoshi
Deo Duy-Vu N.
Morrison & Foerster / LLP
Sanyo Electric Co,. Ltd.
LandOfFree
Method of manufacturing optical semiconductor integrated... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing optical semiconductor integrated..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing optical semiconductor integrated... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3683091