Method of manufacturing optical memory element

Details Method of manufacturing optical memory element Method of manufacturing optical memory element

1987-02-24

1988-10-18

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430 5, 430323, 430394, 430397, 430945, 369279, 369285, G03C 500, G11B 372

Patent

active

047787473

ABSTRACT:
A method of manufacturing an optical memory element, which includes the steps of applying a first photo-resist layer onto a glass substrate for an optical memory element, laying a mask plate on the glass substrate applied with the first photo-resist layer, with the mask plate being prepared by covering a surface of a transparent substrate with metallic layers formed into a guide pattern configuration, irradiating ultraviolet rays onto the first photo-resist layer through the mask plate, transferring the guide patterns of the mask plate onto the first photo-resist layer, and engraving the guide patterns in the glass substrate by etching after developing the first photo-resist layer.

REFERENCES:
patent: 4423137 (1983-12-01), Rester
patent: 4555471 (1985-11-01), Barzynski et al.
patent: 4655876 (1987-04-01), Kawai et al.

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