Method of manufacturing non-linear resistive element array

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430 20, 430330, 350334, G03C 500

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048957895

ABSTRACT:
A method for manufacturing a non-linear resistive element array on a substrate, comprising: depositing a first conductive layer on the substrate and selectively forming the layer in a desired pattern; depositing a non-linear resistive layer on the first conductive layer; depositing a second conductive layer on the non-linear resistive layer; forming the second conductive layer in a desired pattern by etching process using a patterned resist layer as a mask; and forming the non-linear resistive layer in a desired pattern using the resist layer as a mask.

REFERENCES:
patent: 4738513 (1988-04-01), Nishiura et al.
patent: 4828370 (1989-05-01), Suzuki
patent: 4842372 (1989-06-01), Toyama

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