Method of manufacturing nano-crystalline silicon dot layer

Details Method of manufacturing nano-crystalline silicon dot layer Method of manufacturing nano-crystalline silicon dot layer

2011-04-19

2011-04-19

Meeks, Timothy H (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C438S257000, C438S263000, C438S264000, C117S935000

Reexamination Certificate

active

07927660

ABSTRACT:
A method of manufacturing a nano-crystalline silicon dot layer is provided. A silicon layer is formed over a substrate. The silicon layer includes crystalline silicon region and amorphous silicon region. An oxidation process is performed to oxidize the amorphous silicon region and the surfaces of the crystalline silicon region to form a silicon oxide layer containing nano-crystalline silicon dots.

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