Method of manufacturing monocrystalline thin-film

Details Method of manufacturing monocrystalline thin-film Method of manufacturing monocrystalline thin-film

1986-12-19

1989-01-31

Pal, Asok

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566161, 1566162, 1566163, 156DIG86, 156DIG64, 427 531, 4273762, C30B 108

Patent

active

048013510

ABSTRACT:
Improvements in a method for performing a monocrystallizing operation through the application of energy beams upon a non-monocrystalline thin-film of non-crystalline or polycrystalline material formed on a non-crystalline insulating film. The resulting superior monocrystalline thin-film has a crystal direction coinciding with that of the monocrystalline silicon base-plate and is formed on the insulating film even if the insulating film is as thick as 4 .mu.m. The thin-film is sufficiently covered between the active layers of a three-dimensional circuit element on the monocrystalline silicon base plate. '

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Jadus et al., IBM Technical Disclosure Bull., vol. 14 (7), Dec. 1971.
Tamura et al., Jap. J. Appl. Physics, vol. 19, pp. L23-26, (1980).

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