Method of manufacturing microchannel electron multipliers

Details Method of manufacturing microchannel electron multipliers Method of manufacturing microchannel electron multipliers

1991-11-12

1993-04-27

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156657, 1566591, 156662, 156667, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

052059022

ABSTRACT:
A microchannel plate and method is disclosed. In a preferred embodiment the microchannel plate is a water of anisotropically etchable material having been subjected to a directionally applied flux of reactive particles against at least one face of the wafer in selected areas corresponding to microchannel locations. The flux removes material from the selected areas to produce microchannels in the wafer in accordance with the directionality of the applied flux.

REFERENCES:
patent: 4217489 (1980-08-01), Rosier
patent: 4577133 (1986-03-01), Wilson
patent: 4589952 (1986-05-01), Behringer et al.
patent: 4624736 (1986-11-01), Gee et al.
patent: 4624739 (1986-11-01), Nixon et al.
patent: 4659429 (1987-04-01), Isaacson et al.
patent: 4693781 (1987-09-01), Leung et al.
patent: 4698129 (1987-10-01), Puretz et al.
patent: 4707218 (1987-11-01), Giammarco et al.
patent: 4725332 (1988-02-01), Sphor
patent: 4734158 (1988-03-01), Gillis
patent: 4740267 (1988-04-01), Knauer et al.
patent: 4764245 (1988-08-01), Grewal
patent: 4780395 (1988-10-01), Saito et al.
patent: 4786361 (1988-11-01), Sekine et al.
patent: 4790903 (1988-12-01), Sugano et al.
patent: 4794296 (1988-12-01), Warde et al.
patent: 4802951 (1989-02-01), Clark et al.
patent: 4806827 (1989-02-01), Eschard
patent: 4825118 (1989-04-01), Kyushima
Lincoln et al., J. Vac. Sci. Technol. B. vol. 1, No. 4, Oct.-Dec. 1983 "Large Area Ion Beam Assisted Etching of GaAs with High Etch Rates and Controlled Anisotrophy".

Affiliated with

Also associated with

Rating

Method of manufacturing microchannel electron multipliers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing microchannel electron multipliers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing microchannel electron multipliers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2324483