Method of manufacturing magnetic recording medium

Details Method of manufacturing magnetic recording medium Method of manufacturing magnetic recording medium

1997-08-25

1999-09-21

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429825, 20419215, C23C 1434

Patent

active

059549270

ABSTRACT:
A method of manufacturing a magnetic recording medium by using an in-line sputtering apparatus to successively form, on a substrate, at least one underlying layer, a first magnetic CoPt-based film, a nonmagnetic intermediate film, and a second magnetic CoPt-based film. The underlying film and/or the nonmagnetic film, which are in contact with the first magnetic film, are deposited at a low sputtering power between 100 and 1000 watts to improve the magnetic properties of the magnetic recording medium. Low power sputtering is also effective to improve the distribution of difference of the crystal lattice spacings between the nonmagnetic intermediate film and the first magnetic film and between the underlying layer and the first magnetic film.

REFERENCES:
patent: 4880514 (1989-11-01), Scott et al.
patent: 5057200 (1991-10-01), Lal et al.
patent: 5078846 (1992-01-01), Miller et al.
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5746893 (1998-05-01), Kobayashi et al.
Patent Abstracts of Japan, Abstract of JP-A 6-020321.

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