Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1975-03-21
1976-07-06
Mack, John H.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, 357 15, 427 38, 427 84, 118 491, C23C 1500, H01L 2948
Patent
active
039680193
ABSTRACT:
By forming a metallic coating on a sufficiently cleaned semiconductor substrate through ion plating, a low power loss and high switching speed semiconductor device is obtained which differs from an ordinary semiconductor device with a diffused junction. In an interface between the metallic coating and the semiconductor substrate, a considerably thin metal-injected layer is formed toward the semiconductor substrate. Schottky barrier devices may be formed by the method of the invention.
REFERENCES:
patent: 3451912 (1969-06-01), D'Hevrle
patent: 3832232 (1974-08-01), Sohlbrand
patent: 3855612 (1974-12-01), Rosvold
D. M. Mattox, "Fundamentals of Ion Plating", J. Vac. Sci. Technol. vol. 10, no. 1, pp. 47-52, (1973).
R. T. Johnson, Jr. et al., "Resistive Properties of Indium & Indium-Galuum Contacts to CdS", Solid State Elect., vol. 11, pp. 1015-1020. (1968).
"Sputtering & Ion Plating", NASA Special Pub., SP-5111, (1972).
Asai Osamu
Fuyama Moriaki
Hanazono Masanobu
Iimura Masao
Okamura Masahiro
Hitachi , Ltd.
Mack John H.
Weisstuch Aaron
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