Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-06-07
2005-06-07
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S396000, C430S005000, C430S313000, C438S725000
Reexamination Certificate
active
06902868
ABSTRACT:
In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1is used which is provided partially with a light shielding patterns3aformed of a resist film, in addition to light shielding patterns formed of a metal.
REFERENCES:
patent: 2004/0063037 (2004-04-01), Hasegawa et al.
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Hasegawa Norio
Miyazaki Ko
Mori Kazutaka
Okada Joji
Tanaka Toshihiko
Chacko-Davis Daborah
McPherson John A.
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