Method of manufacturing fine T-shaped electrode

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S313000, C430S314000, C430S330000

Reexamination Certificate

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07923198

ABSTRACT:
A method of manufacturing a fine T-shaped electrode includes a step of forming a laminated resist which includes at least a photoresist layer as an uppermost layer; a step of forming an uppermost layer opening by irradiating the laminated resist with light to pattern only the photo resist layer and form an uppermost layer opening; a step of reducing the diameter of the uppermost layer opening by coating a resist pattern thickening material on the photoresist layer; a step of forming a lowermost layer opening by transferring the uppermost layer opening formed in the photoresist layer to a lower layer of the photoresist, and penetrating the laminated resist; a step of reducing the size of the lowermost opening in the lowermost layer of the laminated resist; and a step of forming a T-shaped electrode in the opening part formed through the laminated resist.

REFERENCES:
patent: 5858620 (1999-01-01), Ishibashi et al.
patent: 6620716 (2003-09-01), Makiyama et al.
patent: 2003/0102285 (2003-06-01), Nozaki et al.
patent: 5-198596 (1993-08-01), None
patent: 7-153666 (1995-06-01), None
patent: 10-107044 (1998-04-01), None
patent: 11-307549 (1999-11-01), None
patent: 2001-189283 (2001-07-01), None

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