Method of manufacturing field emission device

Details Method of manufacturing field emission device Method of manufacturing field emission device

2007-06-22

2011-10-11

Ton, Toan (Department: 2889)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

C445S050000

Reexamination Certificate

active

08033881

ABSTRACT:
A method of manufacturing a field emission device comprises: sequentially forming cathodes and a light blocking layer on a substrate, and patterning the light blocking layer to form blocking layer holes; sequentially forming an insulating layer and a gate material layer on the light blocking layer, and patterning the gate material layer to form gate electrodes in which gate electrode holes are formed; coating a photoresist on the gate electrodes, and exposing and developing the photoresist to form resist holes inside the gate electrode holes; isotropically etching portions of the insulating layer exposed through the resist holes to form insulating layer holes; etching portions of the gate electrodes exposed by the insulating layer holes to form gate holes, and removing the photoresist; and forming emitters on the cathode electrodes exposed by the blocking layer holes.

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patent: 2008/0108271 (2008-05-01), Kang et al.

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