Method of manufacturing etalon

Details Method of manufacturing etalon Method of manufacturing etalon

2005-09-13

2005-09-13

Olsen, Allan (Department: 1763)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S024000, C216S066000, C216S067000, C216S080000

Reexamination Certificate

active

06942812

ABSTRACT:
In producing an etalon, a thickness of an etalon base plate is measured, and the etalon base plate is placed in a process chamber. Then, a gas having a chemical reactivity with respect to a material of the etalon base plate is introduced into the process chamber, and a surface of the etalon base plate is etched for only a predetermined time corresponding to a thickness of the etalon base plate, thereby obtaining the etalon having a desired thickness.

REFERENCES:
patent: 5021121 (1991-06-01), Groechel et al.
patent: 6005995 (1999-12-01), Chen et al.
patent: 6323987 (2001-11-01), Rinaudo et al.
patent: 6421365 (2002-07-01), Kleinschmidt et al.
patent: 6464842 (2002-10-01), Golovchenko et al.
patent: 6639682 (2003-10-01), Neily et al.

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