Coating processes – Electrical product produced – Metallic compound coating
Patent
1997-05-09
1999-08-03
Beck, Shrive
Coating processes
Electrical product produced
Metallic compound coating
427240, 4272481, 4273762, B05D 512, B05D 312, C23C 1600
Patent
active
059322810
ABSTRACT:
A method of forming a Bi-layered ferroelectric thin film on a substrate with good reproducibility, using a mixed composition of a Bi-containing organic compound and a metal polyalkoxide compound by at least one technique selected from the group consisting of molecular deposition such as CVD, and spincoat-sintering.
REFERENCES:
patent: 5453404 (1995-09-01), Kirlin et al.
patent: 5527567 (1996-06-01), Desu et al.
patent: 5612082 (1997-03-01), Azuma et al.
patent: 5688565 (1997-11-01), McMillan et al.
R. Papiernik, et al., "Synthesis, Characterization and Reactivity of Lead(II) Alkoxides and Oxoalkoxides: Condensation to Oxoalkoxides as a General Structural Feature", Polyhedron, vol. 14, pp. 1657-1662.
Y. Shimada, et al., "Integration Technology of Ferroelectrics and the Performance of the Integrated Ferroelectrics", Integrated Ferroelectrics, vol. 11, pp. 229-245.
Eiji Fujii, et al., "Ferroelectric Memory Technology", National Technical Report, vol. 41, No. 6, pp. 692-698.
Peter C. Van Buskirk, et al., "Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition", Jpn. J. Appl. Phys., vol. 35, pp. 2520-2525.
Mikio Yamamuka, et al., "Reaction Mechanism and Electrical Properties of (Ba, Sr)TiO.sub.3 Films Prepared by Liquid Source Chemical Vapor Deposition", Jpn. J. Appl. Phys., vol. 35, pp. 2530-2535.
Arita Koji
Azuma Masamichi
Hochido, deceased Yukoh
Kadokura Hidekimi
Matsumoto Masamichi
Barr Michael
Beck Shrive
Kojundo Chemical Laboratory Co., Ltd.
Matsushita Electronics Corporation
Symetrix Corporation
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