Method of manufacturing aperture plate

Details Method of manufacturing aperture plate Method of manufacturing aperture plate

2005-02-22

2005-02-22

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S576000

Reexamination Certificate

active

06858263

ABSTRACT:
A method of manufacturing an aperture plate using a plasma excitation chemical vapor deposition (CVD) device includes the steps of placing a metal plate in a vacuum chamber of the CVD device; discharging air inside the vacuum chamber; charging a mixture of a gas containing at least osmium and a gas containing a hydrogen gas; adjusting a pressure of the vacuum chamber at a predetermined level; and generating plasma inside the vacuum chamber. An electrically conductive amorphous coating having a dense structure is uniformly formed over a surface and an interior of a micro-hole of the aperture plate. Also, it is possible to form an osmium coating having a high purity and a low impurity content with good repeatability.

REFERENCES:
patent: 3785783 (1974-01-01), Mynard et al.
patent: 5372849 (1994-12-01), McCormick et al.
patent: 5403620 (1995-04-01), Kaesz et al.

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