Method of manufacturing an optical stripline waveguide for non-r

Details Method of manufacturing an optical stripline waveguide for non-r Method of manufacturing an optical stripline waveguide for non-r

1987-05-18

1989-07-18

Valentine, Donald R.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041923, 20419226, C23C 1406, C23C 1434, C23C 1454

Patent

active

048490806

ABSTRACT:
A method is disclosed of manufacturing an optical stripline waveguide for use in non-reciprocal optical components, in which a monocrystalline waveguide strip having a refractive index n.sub.2, which is surrounded by material with a lower refractive index n.sub.1, is provided on a monocrystalline substrate, the waveguide strip and the material surrounding it being deposited on a substrate by means of RF cathode sputtering (sputter epitaxy) in an inert gas plasma, making use of a target which contains mainly iron garnet phase, together with other phases with an almost equal sputtering rate, the crystal lattice of said substrate being locally disturbed in the surface regions where no waveguide strip is to be grown, thereby forming a lattice disorder.

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patent: 4376138 (1983-03-01), Alferness et al.
patent: 4413877 (1983-11-01), Suzuki et al.
patent: 4608142 (1986-08-01), Gomi et al.

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