Method of manufacturing an optical device with a groove accurate

Details Method of manufacturing an optical device with a groove accurate Method of manufacturing an optical device with a groove accurate

1999-01-28

2000-09-26

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

385 40, 385 49, 385 50, 385 51, 385140, G03C 500, G02B 626, G02B 600

Patent

active

06124080&

ABSTRACT:
A first layer (2) and a second layer (3) are formed on a substrate (1). The first layer is made of a resist against a groove-sculpturing etchant used in etching the substrate while the second layer is made of an anti-corrosive material against dry etching. The second layer is at first patterned into a patterned second layer (3a) in the form of a groove-sculpturing mask pattern (8). With the patterned second layer used as a mask, the first layer is etched and patterned into a patterned first layer (2a) in the form of the above-mentioned mask pattern. With the patterned first layer used as a mask, the substrate is etched to form a groove (9).

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