Method of manufacturing an electroluminescent panel without any

Details Method of manufacturing an electroluminescent panel without any Method of manufacturing an electroluminescent panel without any

1986-06-26

1987-07-28

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20419217, 20419222, 20419223, 20419228, 20419229, 427 69, 4274193, C23C 1400

Patent

active

046830448

ABSTRACT:
In an electroluminescent panel which in turn comprises a transparent electrode member on a transparent substrate, a first dielectric layer, an electroluminescent layer, a second dielectric layer, and a back electrode member, at least one of the first and the second dielectric layers is divided into first and second partial dielectric films nearer to and farther from the transparent electrode member, respectively. The first partial dielectric film is deposited in a nonoxidization atmosphere by the use of a pellet which essentially consists of silicon and oxygen. Thereafter, the second partial dielectric film is deposited on the first partial dielectric film in an oxygen atmosphere and has a relative dielectric constant greater than the first partial dielectric film. Alternatively, each of the first and the second dielectric layers may comprise the first partial dielectric film of silicon and oxide and the second partial dielectric film mentioned above.

REFERENCES:
patent: 4027192 (1977-05-01), Hanak
patent: 4279726 (1981-07-01), Baird et al.
patent: 4389295 (1983-06-01), Davey et al.
patent: 4508610 (1985-04-01), Freeman et al.

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