Method of manufacturing an electrically conductive pattern of ti

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156654, 156655, H01L 2100, H01L 2102, H01L 21312

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active

053665880

ABSTRACT:
Method of manufacturing an electrically conductive pattern of tin-doped indium oxide (ITO) on a substrate.
Tin-doped indium oxide (ITO) can be selectively etched relative to the metals Mo, W and TiW in an etching bath which is obtained by diluting concentrated halogen acid, for example hydrochloric acid, with a liquid having a lower dielectric constant than water, such as acetic acid or methanol. This is particularly advantageous in the manufacture of the MIM switching elements which are present on the active plate of LCDs.

REFERENCES:
patent: 4093504 (1978-06-01), Ponjee et al.
patent: 4448637 (1984-05-01), Hiraishi et al.

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