Method of manufacturing an array substrate for a liquid...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C438S949000

Reexamination Certificate

active

07125757

ABSTRACT:
An advantage of the present invention is to provide a method of manufacturing an array substrate for a liquid crystal display device in which a mask that has double slits in it is used in the photolithographic masking process for the pixel electrode to reduce the distance between a pixel electrode and a neighboring pixel electrode and thus reduce the width of a data line, which results in an improvement of the aperture ratio.

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Stanley Wolf and Richard N. Tauber, Silicon Processing for The VLSI Era, Lattice Press, vol. I, 407-409 and 416.

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