Method of manufacturing a tube having a film on its inner periph

Details Method of manufacturing a tube having a film on its inner periph Method of manufacturing a tube having a film on its inner periph

1995-01-31

1999-08-10

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429821, 118723E, 118723MP, 427569, 427571, C23C 1434

Patent

active

059353910

ABSTRACT:
A rod-like electrode is disposed in a vacuum container, a ring-like electrode is disposed around the rod-like electrode, a tube to be processed is disposed such that the tube is substantially continuous to the ring-like electrode, an interior of the vacuum container is set to a predetermined degree of vacuum for deposition, a gas is introduced into a space between the electrodes, an electric power for forming plasma from the gas is applied while applying a magnetic field, and the plasma produced thereby is supplied into the tube. If the deposition material gas is used, the film is formed on the inner peripheral surface of the tube. If the plasma source gas for sputtering is used, a sputtering voltage is applied to a sputtering target disposed inside the tube, so that the film is formed on the inner peripheral surface of the tube by sputtering the target with ions in the plasma.

REFERENCES:
patent: 4376025 (1983-03-01), Zega
patent: 4407713 (1983-10-01), Zega
patent: 4478703 (1984-10-01), Edamura et al.
patent: 4511451 (1985-04-01), Sella et al.
patent: 4764398 (1988-08-01), Croitoru et al.
patent: 4904362 (1990-02-01), Gaertner et al.
patent: 4960753 (1990-10-01), Collins et al.
patent: 5272735 (1993-12-01), Bryan et al.
patent: 5298137 (1994-03-01), Marshall, III

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