Method of manufacturing a thin film transistor array panel

Details Method of manufacturing a thin film transistor array panel Method of manufacturing a thin film transistor array panel

2007-07-12

2008-09-16

Geyer, Scott B. (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S780000, C257SE21411, C257SE21414, C257SE27111

Reexamination Certificate

active

07425479

ABSTRACT:
The present invention provides a thin film transistor array panel comprising: an insulating substrate; a first signal line formed on the insulating substrate and extending in a first direction; a second signal line formed on the insulating substrate, extending in a second direction, and intersecting the first signal line; a thin film transistor connected to the first and second signal lines; a passivation layer formed on the second signal line and having a contact hole exposing a portion of the second signal line; and a pixel electrode formed on the passivation layer and connected to the thin film transistor through the contact hole, wherein the passivation layer is formed by coating an organic solution that includes an organic insulating material and a solvent including at least one of PGMEP, EEP, and nBA.

REFERENCES:
patent: 6130379 (2000-10-01), Shiotsuka et al.
patent: 6162745 (2000-12-01), Ito et al.
patent: 2003/0086046 (2003-05-01), You

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