Method of manufacturing a thin film battery

Details Method of manufacturing a thin film battery Method of manufacturing a thin film battery

2005-07-26

2005-07-26

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192150, C204S192120, C427S115000

Reexamination Certificate

active

06921464

ABSTRACT:
In a method of manufacturing a thin film battery in a chamber, a target comprising LiCoO2is provided on a magnetron cathode in the chamber, and a substrate is placed facing the target. A process gas is introduced into the chamber and the process gas is energized to form a plasma to sputter the target to deposit LiCoO2on the substrate. An ion flux of from about 0.1 to about 5 mA/cm2is delivered from the plasma to the substrate to enhance the crystallinity of the deposited LiCoO2material on the substrate. The process gas is exhausted from the chamber. The target can also be made of other materials.

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