Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1990-04-16
1992-12-08
Beck, Shrive
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156656, 156901, 427102, 427307, C23C 2600
Patent
active
051694930
ABSTRACT:
A conductive paste layer of less than 5 .mu.m is formed on an insulating substrate. After a drying and a baking treatment of the conductive paste layer, an etching is carried out to form a plurality of electrode pairs. Resistor layers are formed corresponding to each pair of the electrodes so as to partially overlap with the electrodes.
REFERENCES:
patent: 2748234 (1956-05-01), Clarke
patent: 3366519 (1968-01-01), Pritchard
patent: 3699650 (1972-10-01), Cocca
patent: 4140817 (1979-02-01), Brown
patent: 4205392 (1980-05-01), Byrum, Jr.
patent: 4241103 (1980-12-01), Ohkubo
patent: 4316920 (1982-02-01), Brown
patent: 4503090 (1985-03-01), Brown
patent: 4539223 (1985-09-01), Hormadaly
Fukuoka Yoshitaka
Nii Minoru
Beck Shrive
Dang Vi Duong
Kabushiki Kaisha Toshiba
LandOfFree
Method of manufacturing a thick film resistor element does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing a thick film resistor element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing a thick film resistor element will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-958772