Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1988-03-28
1990-09-18
Morgenstern, Norman
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
505701, 505705, 505728, 505731, 505742, 156643, 426 62, 426 63, H01L 3912, B05D 512
Patent
active
049579002
ABSTRACT:
A superconducting ceramic film is deposited on a substrate sputtering. In virtue of the low thermal conductivity of ceramic, a laser beam is radiated to the ceramic film in order to remove the irradiated portion by sublimation and produce a pattern on the ceramic film.
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Applied Physics Letters, vol. 51, No. 23, Dec. 7th 1987, pp. 1951-1953, American Institute of Physics, New York, N.Y., U.S.; M. Scheuermann et al.; "Magnetron Sputtering and Laser Patterning of High Transition Temperature Cu Oxide Films".
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Inam et al., Appl. Phys. Lett., 51(14), Oct. 5, 1987.
Bueker Margaret
Morgenstern Norman
Semiconductor Energy Laboratory Co,. Ltd.
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