Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2007-01-02
2007-01-02
Norton, Nadine (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S026000, C216S096000, C216S097000
Reexamination Certificate
active
10764606
ABSTRACT:
A method of manufacturing a substrate5with a plurality of concave portions3according to the invention includes the steps of forming a mask6on the substrate5, forming a plurality of initial holes61on the mask6by means of a physical method such as blast processing or irradiation with laser beams, and forming the plurality of concave portions in the substrate5by subjecting the mask6with the plurality of initial holes61to an etching process. In case of carrying out the blast processing, glass beads whose average diameter is in the range of 50 to 100 μm are used as blast media.
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Wolf et al., Silicon Processing for the VLSA Era, 1986, Lattice Press, vol. 1, pp. 532-533.
Shimizu Nobuo
Yamashita Hideto
Norton Nadine
Tran Binh X.
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