Method of manufacturing a sensor having a magnetic field sensiti

Details Method of manufacturing a sensor having a magnetic field sensiti Method of manufacturing a sensor having a magnetic field sensiti

1985-01-31

1987-05-19

Czaja, Donald E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29571, 29580, 156656, 20419232, H01L 4308, H01L 4312

Patent

active

046665544

ABSTRACT:
A sensor suitable for measuring magnetic field gradients spanning very small regions has a magnetic field-sensitive element (37, 42) with a very accurately defined height and thickness (even into the nanometer range) which is perpendicular to the surface of a substrate (30, 41) so that the substrate surface may be used in aligning the element (37, 42) and is manufactured by, for example, depositing magnetic field-sensitive material (9) integrally on the surface of a substrate (5) and the walls and the bottom of a groove (8) provided therein and by removing the deposited material by means of an ion etching process with an ion beam incident at right angles to the substrate surface so that only the deposited material (10) on the walls remains.

REFERENCES:
patent: 4151574 (1979-04-01), Gerkema et al.
patent: 4256514 (1981-03-01), Pogge
patent: 4353086 (1982-10-01), Jaccodine et al.
patent: 4432132 (1984-02-01), Kinsbron et al.
patent: 4444617 (1984-04-01), Whitcomb
patent: 4460413 (1984-07-01), Hirata et al.
Okazaki et al., "Edge-Defined Patterning of Hyperfine Refractory Metal Silicide MOS Structures", IEEE Transactions on Electron Devices, vol. ED-28, No. 11, pp. 1364-1367, Nov. 1981.

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