Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1986-01-29
1987-11-03
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430156, 430273, 430292, 430330, 430394, G03C 500
Patent
active
047043474
ABSTRACT:
A method of manufacturing a semiconductor device, in which there is applied to a surface of a semiconductor substrate a base layer of photosensitive lacquer, which is coated with a top layer of photosensitive lacquer. By means of a first patterned irradiation, there is formed in the top layer a mask of which a contact copy is formed in the base layer during a second irradiation. A material which can be discolored is used for the top layer. During the first irradiation, the top layer is locally discolored, whereupon the layer thus discolored is used as a mask during the second irradiation. By the use of the discoloring top layer, additional processing steps, which would ensure from a wet development of the top layer, are avoided.
REFERENCES:
patent: 4251619 (1981-02-01), Kurita
patent: 4362809 (1982-12-01), Chen et al.
patent: 4555471 (1985-11-01), Barzynski et al.
Dil Jan G.
Kroon Henricus J. J.
Nijssen Wilhelmus P. M.
Spiertz Elisabeth J.
Vollenbroek Franciscus A.
Dees Jos,e G.
Kittle John E.
Spain Norman N.
U.S. Philips Corporation
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